ieeelogoblue.gif Electron Devices Society
Santa Clara Valley Chapter
http://www.ewh.ieee.org/r6/scv/eds/
The field of interest of the IEEE EDS is all aspects of the physics, theory, and phenomena of electron and ion devices, such as elemental and compound semiconductor devices, quantum effect devices, optical devices, tubes and other vacuum devices.

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September 1, 2006
For an online version of this announcement with active links, please visit
http://www.ewh.ieee.org/r6/scv/eds/announcements/ieee-scv-eds-20060901.html
September 12th Meeting
Albert Bergemont - Maxim on "Future and Limitations for Floating Gate NVM Manufacturing"
September 26th Meeting
Kurt Stokbro - Copenhagen Univ.
"Challenges in Modeling Nanoscale Devices"


 
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Albert-Bergemont-Maxim.jpg Upcoming IEEE SCV EDS Evening Meeting:

September 12, 2006 IEEE SCV EDS Meeting:

"Future and Limitations for Floating Gate NVM Manufacturing"

Speaker: Albert Bergemont - Maxim Integrated Products
Subject: "Future and Limitations for Floating Gate NVM Manufacturing"
Location: National Semiconductor, Building 31 Large Auditorium,
955 Kifer Road, Sunnyvale, CA.   See the meeting location map
Time: 6:00 PM - Pizza , 6:15 PM - Lecture
Speaker Contact: Jayasimha Prasad

Abstract:

This talk will review the expected flash memory scaling limits below 45 nanometers and present the most promising emerging flash memory technologies for mass storage applications.

Floating gate flash memory scaling has been phenomenal in the last 15 years. As a result, the overall flash memory market has grown at an unprecedented pace, mainly driven by exploding customer demand for mobile mass storage applications such as digital cameras, MP3 players, and cell phones.

In such a large commodity market, the course for further flash memory cell scaling has led to tremendous R&D activity in the last few years with NAND density doubling almost every year.

Although it is expected that flash memory cells will continue to scale, there are several physical limitations to confront, and scaling down beyond 45nm is a concern, especially for the floating gate memory architectures.



Upcoming IEEE SCV EDS Evening Meeting:

Biography:

Albert Bergemont was born in Toulouse, France, in 1953. He graduated from the French National Institute of Applied Sciences, where he received the B.S degree in Physics and Solid State Physics in 1975.

Up to 1995, he was mainly involved with technology development of non-volatile technologies (stand-alone EEPROM, EPROM, FLASH) successively at Harris Semiconductor (first CMOS EEPROM, ahead of Intel), SGS-THOMSON Micro (several NVM platforms from 0.8µm down to 0.35µm) and National Semiconductor (first AMG EPROM with Boaz Eitan, and first contact-less NOR Virtual Ground Flash, using channel erase, ahead of all the other semiconductor industry players.

From 1995 to 2000 at National Semiconductor, he also developed and transferred successfully to production three generations of core CMOS and mixed-mode modules down to 0.18µm.

He invented and demonstrated ahead of all the industry the free P-channel OTP and MTP concepts, now widely used worldwide. He also developed with Carver Mead the first Active Pixel Sensor CMOS imager (0.18µm), while the rest of the world was still using CCDs.

He joined Maxim Integrated Products in 2000, where he is currently the TR&D Executive Director. He is in charge of core analog CMOS/Bipolar/HV technology platforms which also feature embedded NVM (EEPROM and Flash).

He has authored and co-authored around 50 technical papers.

He currently holds 181 patents with a few more pending at Maxim.

For more information on   Albert Bergemont



Kurt-Stokbro-Copenhagen.jpg Upcoming IEEE SCV EDS Evening Meeting:

September 26, 2006 IEEE SCV EDS Meeting:

"Challenges in Modeling Nanoscale Devices"

Speaker: Associate Professor Kurt Stokbro - University of Copenhagen, Denmark
Subject: "Challenges in Modeling Nanoscale Devices"
Location: National Semiconductor, Building 31 Large Auditorium,
955 Kifer Road, Sunnyvale, CA.   See the meeting location map
Time: 6:00 PM - Pizza , 6:15 PM - Lecture
Speaker Contact: Ranjeet Pancholy

Abstract:

This talk discusses some of the challenges we are facing when electronic devices are approaching the atomic scale and we need to take into account the quantum nature of electrons.

In the first part, I will give an introduction to the field of quantum transport, and describe how the quantum nature of electrons changes the properties of nanoscale devices and the challenges we face.

The modelling of quantum transport is particularly difficult since the small scale requires that the quantum nature and the atomic details of the system be accurately described, while the size of the system often comprises millions of atoms.

Some years ago we introduced the important notion of dividing a nanoscale device into an active device region and a passive electrode region [1]. In this way, the simulation can often be limited to describing a few hundred atoms, and it is possible to calculate the current-voltage characteristics of the device with ab initio electronic structure techniques [1].

The scheme for ab initio calculation of quantum transport, developed by Dr. Stokbro and his co-workers, has become the de facto standard for electron transport calculations, and has laid the foundation for the company Atomistix A/S.

In the second part of the talk, I will tell the story behind Atomistix, the theory behind their software products, and some insight gained on using their software to model the electrical properties of nanoscale devices like carbon nanotubes[1], 1-D graphene sheets, molecular electronic devices[2], atomic wires[3], spintronics components or interfaces between different materials[4].



Upcoming IEEE SCV EDS Evening Meeting:

Abstract (Continued):

Finally I will point towards the current challenges and future directions within the field of quantum transport and nanoscale modelling and describe how Atomistix is addressing these challenges[5].

References:

1. Mads Brandbyge, Jose-Luis Mozos, Pablo Ordejon, Jeremy Taylor, and Kurt Stokbro, Density functional method for nonequilibrium electron transport, Phys. Rev. B. 65, 165401 (2002).
2. K. Stokbro, J. Taylor and M. Brandbyge, Do Aviram-Ratner diodes rectify?, J. of Amer. Chem. Soc. 125(13), 3674 (2003).
3. S. K. Nielsen, M. Brandbyge, K. Hansen, K. Stokbro, J. M. van Ruitenbeek, and F. Besenbacher, Current-Voltage Curves of Atomic-Sized Transition Metal Contacts: Why Au is Ohmic and Pt is Not, Phys. Rev. Lett. 89, 66804 (2002).
4. M. Stilling, K. Stokbro and K. Flensberg, Crystalline Magnetotunnel Junctions: Fe-MgO-Fe, Fe-FeOMgO-Fe and Fe-AuMgOAu-Fe, Proceedings of Nanotech 2006, Boston, May, 2006.
5. K. Stokbro and A. Blom, Challenges in modelling the electrical properties of large-scale nanodevices, Nanos Guide 2006, Wiley and Sons

Biography:

Dr Kurt Stokbro, born in 1965, is an educated physicist, co-founder and Vice President of Atomistix A/S. He is also an Associate Professor at the Niels Bohr Institute, University of Copenhagen, Copenhagen, Denmark.

He is coordinating a number of EU and Danish-funded R&D projects, with a total budget of more than 3 Million Euros.

Dr. Stokbro has published more than 50 papers and review articles in international journals, held a large number of lectures as an invited speaker, and has organized three international conferences in nanoscience.

For more information on   Associate Professor Kurt Stokbro

For more information on   Atomistix A/S



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