Upcoming IEEE SCV EDS Evening Meeting:
Tuesday, January 22, 2008 IEEE SCV EDS Meeting:
"IC Chips - from Scaling to Emerging Nanotechnology"
Speaker: Dr. Bin Yu, NASA Ames Research Center
Subject: "IC Chips - from Scaling to Emerging Nanotechnology"
Location: National Semiconductor, Building E1, Conference Center,
2900 Semiconductor Drive, Santa Clara, CA 95051.
See the NSC Campus driving directions
and the NSC Building E location map
Time: 6:00 PM - Pizza , 6:15 PM - Lecture
Speaker Contact:
J. Prasad
Abstract:
It is predicted that silicon CMOS FET could be ultimately scaled down to 1.5 nm gate
length based on the least energy model for computing. However, it is anticipated
that a gate length of 4~5 nm would be the practical limit (in mass production around
year-2020). In this seminar, some major trends will be discussed of the mainstream
IC chip technology in the next 1½-decade towards the “scaling-end” of ITRS Roadmap.
There are technology candidates that are of strategic importance beyond the Roadmap.
Some were actively explored in research community for long, while a few others were
catching up rapidly.
“Bottom-up” approach, the core concept of nanotechnology, is to employ inexpensive
chemistry to promote self-assembly of mesoscopic architectures. Nanostructures
offer unique properties such as energy efficiency, surface sensitivity, self-assembly,
low material/processing cost, etc., that could be the valuable building blocks for
the next-generation electronic chips. In this seminar, we discuss some potential
“successors” of the concurrent silicon chip technology at the end of Semiconductor
Roadmap. These disruptive technologies are rooted in nanoscale materials or structures
-synthesized by inexpensive chemistry - which exhibit exceptional materials and
electrical properties. The new technologies would help continued advancement, not
necessary through straightforward geometry scaling, of solid-state chip technology
in applications such as information processing and nonvolatile data storage. The
state-of-the-art research in the front will be introduced. Major challenges and
future directions will be also discussed.
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Upcoming IEEE SCV EDS Evening Meeting:
Biography:
Dr. Bin Yu received Ph.D. degree in Electrical Engineering from University of California
at Berkeley. At Berkeley, he conducted research on semiconductor device physics, scaling,
and ultra-thin-body SOI technology. His research interest spans from self-assembly of
functional nanostructures to emerging applications in information processing, storage,
and transmission.
He is presently Senior Scientist at UARC, NASA Ames Research Center. Before that, he led
exploratory device research at Advanced Micro Devices Inc., Sunnyvale, CA, with focus
on novel device architectures and advanced technologies for high-performance
microprocessors.
His technical accomplishments include industry’s first 10-nm silicon double-gate transistor
(IEDM'2002), the industry's first Tera-Hz 15-nm planar silicon logic transistor (IEDM'2001),
the record-thin gate dielectric for CMOS (VLSI'2001), the first demonstration of laser
thermal process in nanoscale CMOS (IEDM'1999), among others. Some of these breakthroughs
were widely reported by public media around the world. He has published over 80 research
papers, delivered about 40 invited talks to conferences, industry, and universities, and
holds more than 100 awarded U.S. patents.
He is AdCom Member of IEEE Nanotechnology Council and Ex-Officio AdCom Member of IEEE
Electron Device Society, and served on technical committees, advisory committees, and
invited rump-session panels of numerous conferences and organizations, including National
Nanotechnology Initiative/SRC Consultative Group and International Roadmaps for Semiconductors.
He served also as consultant to semiconductor companies and venture capital firm in Silicon
Valley. He is IEEE-EDS Distinguished Lecturer, Editor of IEEE Electron Device Letters,
Associated Editor of IEEE Transactions on Nanotechnology, and Consulting Professor of Electrical
Engineering at Stanford University. He was elected IEEE Fellow for recognized accomplishments
in semiconductor nanoelectronics.
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