IPFA Photo Contest - Art of Failure Analysis 2010

Do you have a memorable image during your failure analysis work and feel there is an element of Art in it? Join IPFA’s 3rd Photo Contest: Art of Failure Analysis 2010.

Where: Selected entries will be displayed and prizes awarded at the 16th International Symposium on the Physical and Failure Analysis of Integrated Circuits (IPFA 2010), Singapore.


Contest Criteria: SUBMITTED IMAGES ARE LIMITED TO ONE PER CONTESTANT and should complement the Art component. Images may be obtained by any material imaging technique. Because the focus is on art, the aesthetic rather than the technical quality of the image is the key criterion for the photo contest. Nevertheless, the images must have some connection to failure analysis.


The top 10 entries selected will be displayed during IPFA 2010 and will receive an exclusive IPFA certificate Prizes will be provided